Thought for the month
“You cannot have freedom without a rule of law ... and if you don't have it, what you tend to get is corruption and that is death to freedom, it's death to truth, it's death to honour, it's death to democracy.”
Margaret Thatcher, 1 October 1996.
Friday, 16 April 2010
With ever shrinking dimensions within ICs, the role of metrology in maintaining high yield is critical. Researchers are challenged to get accurate measurements of sub-40nm dense trenches and contact holes coming from 193-immersion lithography or e-beam lithography. CEA-Leti's (www.leti.fr) Hybrid Metrology Project has shown noteworthy results in reducing measurement uncertainty at sub-28nm nodes using an alternative 3D-AFM (atomic force microscope) mode for critical measurements (nanotechwire.com/news.asp?nid=9645). The team aims to help equipment makers develop a critical dimension metrology production tool dedicated to hybrid metrology that will reduce R&D cycle time and improve production yield for manufacturers.