Following my retirement, we have closed our company for new business.
Please do not hesitate to contact me directly, our email portal remeains open and I would be delighted to hear from you and provide ongoing support or advice.
Companies represented up to the end of December 2023. Please now contact them directly.
k-Space Associates, Inc.
Phone: +1 (734) 426-7977
STAIB INSTRUMENTS GmbH
Phone: +49 8761 76 24 0
Friday 16 April 2010
With ever shrinking dimensions within ICs, the role of metrology in maintaining high yield is critical. Researchers are challenged to get accurate measurements of sub-40nm dense trenches and contact holes coming from 193-immersion lithography or e-beam lithography. CEA-Leti's (www.leti.fr) Hybrid Metrology Project has shown noteworthy results in reducing measurement uncertainty at sub-28nm nodes using an alternative 3D-AFM (atomic force microscope) mode for critical measurements (nanotechwire.com/news.asp?nid=9645). The team aims to help equipment makers develop a critical dimension metrology production tool dedicated to hybrid metrology that will reduce R&D cycle time and improve production yield for manufacturers.